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Temas Resources Corp. (ASX:TIO)

ALERT: Price-sensitive ASX Announcement for TIO
Current share price for TIO : $0.100 0.005 (5.26%)+
Announcement
Release
8 Jul 2026 8:24AM
Price at Release
$0.095
Full Release
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Summary
Temas Resources Corp. has expanded its RCL patent portfolio by filing a new patent for vanadium extraction using its proprietary Regenerative Chloride Leach technology, establishing a priority date of July 8, 2026. This filing enhances Temas' intellectual property as the RCL technology now encompasses a variety of critical minerals, including vanadium, titanium, nickel, and rare earth elements. The patent application is based on successful RCL metallurgical testing from Temas' La Blache project in Québec, Canada. Temas' strategy focuses on technology licensing and partnerships, with the RCL technology offering environmental benefits and high recovery rates for target metals.
Key Points
  • Temas Resources Corp. has filed a new process patent for vanadium extraction using its Regenerative Chloride Leach (RCL) technology.
  • The priority filing date for this patent, titled 'Chloride-based process for Vanadium extraction,' is July 8, 2026.
  • The RCL platform has eleven existing patents across various minerals, including a new application for vanadium.
  • The RCL technology supports the extraction of critical minerals like vanadium, titanium, nickel, and rare earth elements.
  • The patent application builds on successful RCL metallurgical testing on vanadium-bearing material from Temas' La Blache project in Québec, Canada.
  • The company's intellectual property strategy emphasizes technology licensing, joint venture opportunities, and strategic processing partnerships.
  • The RCL platform is noted for its environmental benefits, including lower operational costs and reduced energy use.
  • The RCL technology is adaptable to various target minerals and is positioned to deliver high recovery and purity of target metals.
IMPORTANT NOTE: This information is autogenerated and has not been reviewed for accuracy or completeness. You should refer to the full announcement here for further information.