Adisyn Ltd, an Australian technology company, has successfully demonstrated repeatable graphene deposition at temperatures below 300°C, as verified by UNSW Sydney's Associate Professor Rakesh Joshi. This significant achievement, aligned with the company’s US-patented process, positions Adisyn to transition from research and development to engaging with Tier 1 global semiconductor manufacturers. The graphene deposition process uses Atomic Layer Deposition systems standard in semiconductor manufacturing, ensuring compatibility and ease of adoption. The advancements promise to address the limitations of copper interconnects in chips, heralding a shift to graphene due to its superior electrical and thermal properties. Adisyn's success opens doors to significant industry engagements and further scale-up to wafer-level applications.
Key Points
Adisyn Ltd has achieved repeatable graphene deposition below 300°C, verified by UNSW Sydney.
The process allows continuous graphene film formation on a copper substrate using ALD systems.
Raman spectroscopy and UHR-TEM imaging confirmed the process consistency and graphene quality.
Independent verification by UNSW Sydney's Associate Professor Rakesh Joshi.
Graphene deposition at sub-300°C temperatures is compatible with existing semiconductor fabrication processes.
Milestone 2 includes successful achievement of reliable, repeatable deposition results.
Adisyn plans to engage with Tier 1 semiconductor companies for industry adoption.
The graphene process addresses challenges in semiconductor interconnects, aiming to replace copper due to graphene's superior properties.
Adisyn holds a US patent for this low-temperature graphene deposition process.
The company is transitioning from R&D to commercial engagement and scale-up.
IMPORTANT NOTE: This information is autogenerated and has not been reviewed for accuracy or completeness. You should refer to the full announcement here for further information.